Georgia Tech's ALD barrier film addresses one problem, but several technical challenges remain
November 13, 2013 | Analyst Insight
What They Said
At the recent American Vacuum Society (AVS) conference, Georgia Institute of Technology (Georgia Tech) professor Samuel Graham spoke about his group's efforts in atomic layer deposition (ALD) for water...
Deposition and patterning equipment, Printed, flexible, and organic electronics substrates
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