In general, atomic layer deposition (ALD) is an established field of technology that has existed for decades. It is commonly used for depositing thin layers of oxides and other types of ceramic materials at the atomic or nanometer scale, and its typical applications are those that require high-performance coatings, such as nanofabrication and electronics manufacturing. ALD processes are primarily differentiated from each other by speed of deposition, specific process conditions (which are usually proprietary), and the particular material that is deposited.
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