Semiconductor world plans to rely on liquid immersion lithography until 2011 but what comes next remains fuzzy

In October of 2004, we assessed the field of nanolithography tools that could take over the job of patterning semiconductors when today’s 193 nm dry optical lithography (OPL) runs out of steam (see the October 2004 Lux Research Brief “Optical Lithography’s Last Stand”). We concluded that while the d...

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